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1.0mm Thickness Aluminum Al2O3 Ceramic Substrate wafer, High Thermal Conductivity Al2O3 Ceramic plate ,4inch ceramic substrates wafer
Al2O3 Introduce
.STA High alumina ceramic wafer 99.7% Al2O3, Access to the list of our standard dimensions (Alumina and Zirconia Oxide) for electrical, vacuum or temperature resistance application.
Basic properties of high alumina ceramic wafer.
Very hard
Abrasion resistant
Can be milled with great precision
Can be polished
Stable at high temperatures
No open porosity
Excellent electrical properties
Chemically inert
High corrosion resistant
Applications of ceramic parts components.
Mechanical components
Pistons, pump stages
Mechanical seals
Sealing bushes
Faucet keys and seats
Electrical insulator
Pyrometry
Laboratory items, crucibles
Vacuum items
Welding nozzles
Al2O3 Ceramic Feature ＆ Advantagement
| - Product Name: | Alumina / Al2O3 Ceramic Substrate For Thick Film Circuit / 5.5''x7.5'' |
| - Material: | 96% Alumina |
| - Typical Characteristics: | 1. Excellent Electrical Insulation |
| - Typical Applications: | 1. Thick Film Hybrid Integrated Circuit |
| Thickness(mm) | lengthx width ( mm) | ||||||||||
| 0.385 | | | 4″* 4″ | 4.5″* 4.5″ | |||||||
| 0.5 | |||||||||||
| 0.635 | |||||||||||
| 1.0 | |||||||||||
| diameter(mm) | |||||||||||
| 1.0 | Φ16 | Φ20 | Φ30 | Φ40 | Φ50 | Φ60 | Φ75 | Φ80 | |||
| 1.2 | |||||||||||
| 1.5 | |||||||||||
| 2.0 | |||||||||||
| 2.5 | |||||||||||
Polishing Service
Our AlN substrate can be polished(single and double polish) by the advanced machine which imported
from abroad. Ceramic substrate surface roughness can reach to 1nm without porous after being polished.
It is perfectly suitable for the device application of small spec, high precision , wiring density and good stability.
Package ＆ Delivery